Novel Photoresist Developed

Researchers in the -3D Matter Made to Order- Cluster of Excellence expand possibilities of three-dimensional printing of the tiniest microstructures. Researchers of Karlsruhe Institute of Technology (KIT) and Heidelberg University have developed a novel photoresist for two-photon microprinting. For the first time, it can be used to produce three-dimensional microstructures with cavities in the nano-range. The researchers of the joint -3D Matter Made to Order- Cluster of Excellence also investigated how this porous quality can be controlled during the printing process and how this affects the light scattering structures of the microstructures. The light microscopy image using dark field illumination illustrates the strong light scattering of the printed cuboid on the left side. The latter is caused by the porosity of the nanostructure (right). Photoresists are printing inks used to print the tiniest microstructures in three dimensions by so-called two-photon lithography.